DocumentCode :
2804364
Title :
Temperature dependent dielectric absorption characterization and modeling for SiN, Al2O3 and Ta2O5
Author :
Muminovic, H. ; Riess, P. ; Baumgartner, P. ; Klein, P.
Author_Institution :
Infineon Technol. Munich, Munich, Germany
fYear :
2010
fDate :
14-16 Sept. 2010
Firstpage :
293
Lastpage :
296
Abstract :
This paper reports temperature dependant dielectric absorption measurements of SiN, Al2O3 and Ta2O5 MIM capacitors between 100Hz and 10GHz over a broad temperature range. The SiN dielectric clearly shows a temperature dependent dielectric absorption whereas for Al2O3 and Ta2O5 the effect is nearly temperature independent. A model is proposed for the 3 dielectric materials which takes into account dielectric absorption and temperature dependence. Depending on the dielectric material the extraction strategy has to be modified. The temperature dependence of the capacitance has to be split between temperature coefficient and temperature dependent dielectric absorption.
Keywords :
MIM devices; capacitors; dielectric materials; Al2O3; MIM capacitors; SiN; SiN dielectric; Ta2O5; dielectric materials; extraction strategy; temperature coefficient; temperature dependant dielectric absorption measurements; temperature dependence; temperature dependent dielectric absorption characterization; Absorption; Aluminum oxide; Capacitance; Dielectrics; Silicon compounds; Temperature dependence; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference (ESSDERC), 2010 Proceedings of the European
Conference_Location :
Sevilla
ISSN :
1930-8876
Print_ISBN :
978-1-4244-6658-0
Type :
conf
DOI :
10.1109/ESSDERC.2010.5618355
Filename :
5618355
Link To Document :
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