Title :
Substrate bias dependency of sense margin and retention in bulk FinFET 1T-DRAM cells
Author :
Collaert, N. ; Aoulaiche, M. ; De Keersgieter, A. ; De Wachter, B. ; Jurczak, M. ; Altimime, L.
Author_Institution :
Imec, Heverlee, Belgium
Abstract :
The substrate bias in bulk FinFET devices can be used to increase both the sense margin and retention time in 1T memory cells. For given biasing conditions, a substrate bias can be found where sense margin and retention time are optimal. This substrate bias results from a trade-off between the storage of electrons and holes and the impact of the READ conditions.
Keywords :
MOSFET; random-access storage; substrates; 1T memory cells; READ conditions; bulk FinFET 1T-DRAM cells; bulk FinFET devices; retention time; sense margin; substrate bias dependency; Charge carrier processes; Electric potential; FinFETs; Logic gates; Random access memory; Steady-state; Substrates;
Conference_Titel :
Solid-State Device Research Conference (ESSDERC), 2010 Proceedings of the European
Conference_Location :
Sevilla
Print_ISBN :
978-1-4244-6658-0
DOI :
10.1109/ESSDERC.2010.5618428