DocumentCode :
2806566
Title :
A surface-micromachined tunable microgyroscope
Author :
Lee, Ki Bang ; Yoon, Jun-Bo ; Kang, Myung-Seok ; Cho, Young-Ho ; Youn, Sung-Kie ; Kim, Choong-ki
Author_Institution :
Dept. of Mech. Eng., Korea Adv. Inst. of Sci. & Technol., Taejon, South Korea
Volume :
2
fYear :
1996
fDate :
18-21 Nov 1996
Firstpage :
498
Abstract :
We present a surface-micromachined microgyroscope, whose resonant frequency is electrostatically-tunable after fabrication. The microgyroscope has two oscillation modes: a sensing mode and a actuating mode. In a theoretical study, the microgyroscope has been designed so that the resonant frequency in the sensing mode is higher than that in the actuating mode. A 4-mask surface-micromachining process for the tunable microgyroscope has been described, including the deep RIE of a 6 μm-thick LPCVD polycrystalline silicon structure layer. In a experimental study, the resonant frequency in the sensing mode has been matched to that in actuating mode by applying an inter-plate bias voltage. Frequency matching for the fabricated microgyroscope has been achieved at 5.8 kHz under the bias voltage of 2 V in a reduced pressure of 0.1 torr. For an input angular rate of 50°/sec, an output signal of 20 mV has been measured from the tuned microgyroscope for an AC drive voltage of 2 V with a DC bias voltage of 3 V
Keywords :
CVD coatings; circuit resonance; electric sensing devices; elemental semiconductors; gyroscopes; micromachining; microsensors; silicon; sputter etching; 0.1 torr; 2 V; 20 mV; 3 V; 5.8 kHz; 6 mm; AC drive voltage; DC bias voltage; Frequency matching; LPCVD polycrystalline silicon structure layer; RIE; Si; actuating mode; electrostatically-tunable; input angular rate; inter-plate bias voltage; masks; oscillation modes; resonant frequency; sensing mode; surface-micromachined tunable microgyroscope; surface-micromachining process; tunable microgyroscope; Computer displays; Drives; Electrostatics; Fabrication; Mechanical engineering; Micromachining; Microstructure; Resonant frequency; Silicon; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Emerging Technologies and Factory Automation, 1996. EFTA '96. Proceedings., 1996 IEEE Conference on
Conference_Location :
Kauai, HI
Print_ISBN :
0-7803-3685-2
Type :
conf
DOI :
10.1109/ETFA.1996.573900
Filename :
573900
Link To Document :
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