Title :
Study on the voltage-controlled-oscillator circuit implemented with Al/HfO2/Si capacitors
Author :
Tsai-Sheng Pan ; Li-Chun Chang ; Chia-Cheng Ho ; Bi-Shiou Chiou
Author_Institution :
Nat. Chiao-Tung Univ., Hsinchu
Abstract :
Voltage controlled oscillator (VCO) is the most ubiquitous element in all communication systems, wired or wireless. In a wireless system the quality of the communication link is determined in large part by the characteristics of the VCO. The capacitance of metal/insulator/semiconductor (MIS) shows larger variation from the accumulation region to the depletion region. The dielectric constant of hafnium dioxide is larger (around 25) than that of SiO2 (~3.9). Al/Hafnium oxide (HfO2)/Si show a field dependent permittivity and can be used as a dielectric in voltage tunable capacitors. In this work, we used two types of tunable capacitor in the VCO (LC tank and Colpitts circuit) integrated within PCB: one is Al/HfO2/Si (HfO) capacitor, the other one is Philips BB135 p-n junction capacitor for a control. The maximum MIS capacitance ratio is 4.25. The Al/HfO2/Si capacitors are then implemented as the varactor in the VCO circuit.
Keywords :
MIS capacitors; aluminium; hafnium compounds; p-n junctions; silicon; varactors; voltage-controlled oscillators; Al-HfO2-Si; Colpitts circuit; LC tank circuit; MIS capacitors; Philips BB135 p-n junction capacitor; VCO; communication link; dielectric constant; field dependent permittivity; hafnium dioxide; metal-insulator-semiconductor capacitance; varactor; voltage tunable capacitors; voltage-controlled-oscillator circuit; wireless system; Capacitance; Capacitors; Dielectric constant; Dielectrics and electrical insulation; Hafnium oxide; Metal-insulator structures; Permittivity; Tunable circuits and devices; Voltage; Voltage-controlled oscillators; Voltage controlled oscillator; ferroelectric films; harmonic distortion; varactors;
Conference_Titel :
Microsystems, Packaging, Assembly and Circuits Technology, 2007. IMPACT 2007. International
Conference_Location :
Taipei
Print_ISBN :
978-1-4244-1636-3
Electronic_ISBN :
978-1-4244-1637-0
DOI :
10.1109/IMPACT.2007.4433589