DocumentCode :
2808738
Title :
A New Via Hole Structure for Power GaAs MESFET´s and MMIC
Author :
Songfa, Li ; Qingxiang, Liu
Volume :
83
Issue :
1
fYear :
1983
fDate :
31 May-1 Jun 1983
Firstpage :
36
Lastpage :
36
Abstract :
A New Via Hole Structure made by the laser beam technique has been developed. A 1.2mm gate width GaAs power MESFETand an experimental MMIC were fabricated with this method, thus the availability of this new via hole structure has been verified.
Keywords :
Chemical processes; Etching; Gallium arsenide; Inductance; Laser beams; MESFETs; MMICs; Performance evaluation; Semiconductor lasers; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Millimeter-Wave Monolithic Circuits
Type :
conf
DOI :
10.1109/MCS.1983.1151037
Filename :
1151037
Link To Document :
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