Title :
An experimental study on vacuum-ultraviolet photochemical reaction to non-thermal plasma oxidized SF6 gases
Author :
Nanjo, Y. ; Ohyama, R.
Author_Institution :
Dept. of Electr. Eng., Tokai Univ., Kanagawa, Japan
Abstract :
For removal treatments of used sulfur hexafluoride (SF6) gas, a combination process in non-thermal plasma decomposition with photochemical collection toward a suitable material is experimentally investigated. In the present process, oxyfluorides such as SOF2, SO2F2, and SOF4 produced by non-thermal plasma are decomposed by photochemical reactions; consequently the decomposed molecules are adsorbed to a solid calcium compound material. Since the reaction requires relative higher-energy photons to activate the molecules, a vacuum-ultraviolet light irradiation emitted from a Xe discharge lamp is effective to the reaction. The vacuum-ultraviolet photochemical reaction to non-thermal plasma oxidized SF6 gases is evaluated in an experimentally constructed reactor and the SF6 removal treatment based on the photochemical reaction is discussed.
Keywords :
SF6 insulation; decomposition; discharge lamps; photochemistry; plasma chemistry; ultraviolet radiation effects; SF6; SO2F2; Xe; discharge lamp; light irradiation; non-thermal plasma decomposition; photochemical collection; sulfur hexafluoride gas; vacuum-ultraviolet photochemical reaction; Bonding; Chemicals; Gases; Lamps; Photochemistry; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma stability; Sulfur hexafluoride;
Conference_Titel :
Electrical Insulation and Dielectric Phenomena, 2005. CEIDP '05. 2005 Annual Report Conference on
Print_ISBN :
0-7803-9257-4
DOI :
10.1109/CEIDP.2005.1560776