• DocumentCode
    2811398
  • Title

    An experimental study on vacuum-ultraviolet photochemical reaction to non-thermal plasma oxidized SF6 gases

  • Author

    Nanjo, Y. ; Ohyama, R.

  • Author_Institution
    Dept. of Electr. Eng., Tokai Univ., Kanagawa, Japan
  • fYear
    2005
  • fDate
    16-19 Oct. 2005
  • Firstpage
    689
  • Lastpage
    692
  • Abstract
    For removal treatments of used sulfur hexafluoride (SF6) gas, a combination process in non-thermal plasma decomposition with photochemical collection toward a suitable material is experimentally investigated. In the present process, oxyfluorides such as SOF2, SO2F2, and SOF4 produced by non-thermal plasma are decomposed by photochemical reactions; consequently the decomposed molecules are adsorbed to a solid calcium compound material. Since the reaction requires relative higher-energy photons to activate the molecules, a vacuum-ultraviolet light irradiation emitted from a Xe discharge lamp is effective to the reaction. The vacuum-ultraviolet photochemical reaction to non-thermal plasma oxidized SF6 gases is evaluated in an experimentally constructed reactor and the SF6 removal treatment based on the photochemical reaction is discussed.
  • Keywords
    SF6 insulation; decomposition; discharge lamps; photochemistry; plasma chemistry; ultraviolet radiation effects; SF6; SO2F2; Xe; discharge lamp; light irradiation; non-thermal plasma decomposition; photochemical collection; sulfur hexafluoride gas; vacuum-ultraviolet photochemical reaction; Bonding; Chemicals; Gases; Lamps; Photochemistry; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma stability; Sulfur hexafluoride;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Insulation and Dielectric Phenomena, 2005. CEIDP '05. 2005 Annual Report Conference on
  • Print_ISBN
    0-7803-9257-4
  • Type

    conf

  • DOI
    10.1109/CEIDP.2005.1560776
  • Filename
    1560776