DocumentCode :
2811944
Title :
The effect of the collector contact design on the performance and yield of 800V Lateral IGBTs for power ICs
Author :
Camuso, G. ; Udrea, F. ; Udugampola, N. ; Pathirana, V. ; Trajkovic, T.
Author_Institution :
Dept. of Eng., Univ. of Cambridge, Cambridge, UK
fYear :
2015
fDate :
10-14 May 2015
Firstpage :
181
Lastpage :
184
Abstract :
We report here a new physical phenomenon related to contact etch depth in High Voltage Lateral IGBTs (LIGBTs) and propose a design technique to increase yield of LIGBTs in high volume production. We prove for the first time that the contact geometry and placement have direct effect on Collector injection efficiency in LIGBTs. An improved design for 800V LIGBTs obtained by optimising the layout of contact openings is proposed. The new structure resulted in 15% increase in production yield.
Keywords :
insulated gate bipolar transistors; power integrated circuits; LIGBT; collector injection efficiency; contact etch depth; contact geometry; contact opening layout; high voltage lateral IGBT; high volume production; power IC; Contacts; Insulated gate bipolar transistors; Layout; Performance evaluation; Production; Silicon; Temperature measurement; Collector Contact; Injection efficiency; Lateral IGBT; Uniformity; Yield;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices & IC's (ISPSD), 2015 IEEE 27th International Symposium on
Conference_Location :
Hong Kong
ISSN :
1943-653X
Print_ISBN :
978-1-4799-6259-4
Type :
conf
DOI :
10.1109/ISPSD.2015.7123419
Filename :
7123419
Link To Document :
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