Title :
70 mΩ/600 V normally-off GaN transistors on SiC and Si substrates
Author :
Hilt, Oliver ; Zhytnytska, Rimma ; Bocker, Jan ; Bahat-Treidel, Eldad ; Brunner, Frank ; Knauer, Arne ; Dieckerhoff, Sibylle ; Wurfl, Joachim
Author_Institution :
Ferdinand-Braun-Inst., Leibniz-Inst. fuer Hoechstfrequenztechnik, Berlin, Germany
Abstract :
The static and dynamic electrical performance of normally-off p-GaN gate AlGaN/GaN HFETs, manufactured on SiC and on Si substrates are compared. By implementing a p-type GaN gate, normally-off operation with 1 V threshold voltage has been realized for 70 mΩ / 600 V transistors on both substrates. The GaN-on-SiC devices out-perform Si-based superjunction MOSFETs in terms of gate charge and switching energy and feature a low area-specific on-state resistance, also when considering the full chip area. The higher thermal impedance of the GaN-on-Si devices is reflected in a reduced maximum drain current for pulse lengths > 1 μs. However, no significant thermal effect was found for lower pulse powers as targeted for efficient power switching.
Keywords :
III-V semiconductors; MOSFET; aluminium compounds; elemental semiconductors; gallium compounds; high electron mobility transistors; silicon; silicon compounds; wide band gap semiconductors; AlGaN-GaN; HFETs; Si; SiC; dynamic electrical performance; full chip area; gate charge; low area-specific on-state resistance; lower pulse powers; normally-off GaN transistors; p-type GaN gate; power switching; resistance 70 mohm; static electrical performance; superjunction MOSFETs; switching energy; thermal impedance; threshold voltage; voltage 1 V; voltage 600 V; Gallium nitride; Logic gates; Resistance; Silicon carbide; Substrates; Switches; Transistors; GaN; dispersion; dynamic on-state resistance; normally off; self heating; switching;
Conference_Titel :
Power Semiconductor Devices & IC's (ISPSD), 2015 IEEE 27th International Symposium on
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4799-6259-4
DOI :
10.1109/ISPSD.2015.7123433