DocumentCode :
2812983
Title :
High power and high efficiency GaN HEMT with WN Schottky barrier
Author :
Tangsheng Chen ; Jianjun Zhou ; Chunjiang Ren ; Zhonghui Li ; Shichang Zhong ; Bin Zhang
Author_Institution :
Sci. & Technol. on Monolithic Integrated Circuits & Modules Lab., Nanjing Electron. Devices Inst., Nanjing, China
fYear :
2012
fDate :
21-23 Nov. 2012
Firstpage :
162
Lastpage :
164
Abstract :
In this paper, a high power and high efficiency L/S-band GaN HEMT with tungsten nitride (WN) Schottky barrier is presented. By employing WN Schottky barrier, the reaction between the gate electrode and AlGaN layer is minimized and the Schottky barrier reveals good thermal stability. At 2.2 GHz, the developed GaN HEMT with 1.25 mm gate periphery delivers an output power density of 3.3W/mm with 75% maximum power-added efficiency (PAE). The accelerated life test shows that the mean time to failure (MTTF) of the developed devices is 1.8×107 hours at 150°C channel temperature with an activation energy of 1.5 e V. Output power more than 90 W and PAE about 70% are obtained with a 2×12 mm gate periphery packaged device between 1.14 GHz and 1.24 GHz.
Keywords :
Schottky barriers; failure analysis; gallium compounds; high electron mobility transistors; life testing; semiconductor device testing; thermal stability; tungsten compounds; wide band gap semiconductors; GaN; L/S-band HEMT; MTTF; PAE; WN; WN Schottky barrier; accelerated life test; activation energy; efficiency 75 percent; frequency 1.14 GHz to 1.24 GHz; frequency 2.2 GHz; gate electrode; gate periphery; mean time to failure; output power density; power-added efficiency; size 1.25 mm; thermal stability; tungsten nitride Schottky barrier; Gallium nitride; HEMTs; Logic gates; Metals; Power generation; Schottky barriers; Semiconductor device measurement; Gallium nitride; HEMTs; L-band; Microwave devices; Semiconductor-metal interfaces;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Radio-Frequency Integration Technology (RFIT), 2012 IEEE International Symposium on
Conference_Location :
Singapore
Print_ISBN :
978-1-4673-2303-1
Type :
conf
DOI :
10.1109/RFIT.2012.6401647
Filename :
6401647
Link To Document :
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