DocumentCode :
2815281
Title :
Near-field photolithographic method for making two dimensional photonic bandgap structures
Author :
Wei, Pei-Kuen ; Chang, Wei-Lun ; Chang, Yu-Jen
fYear :
2005
fDate :
38544
Firstpage :
1157
Lastpage :
1159
Keywords :
Electron beams; Interference; Lattices; Lithography; Nanostructures; Optical beams; Optical diffraction; Photonic band gap; Throughput; Writing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quantum Electronics Conference, 2005. International
Print_ISBN :
0-7803-9240-X
Type :
conf
DOI :
10.1109/IQEC.2005.1561045
Filename :
1561045
Link To Document :
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