Title :
An improved MMIC design system composed of an electron beam direct drawing, microwave simulation and on-wafer measurement subsystems
Author :
Yamada, T. ; Nishida, M. ; Sawai, T. ; Harada, Y. ; Nakakado, T.
Author_Institution :
Sanyo Electric Co. Ltd., Osaka, Japan
Abstract :
An improved design system is introduced to develop not only new monolithic microwave ICs (MMICs) and their element devices, but also their accurate simulation models. It is composed of electron beam (EB) direct drawing, microwave simulation, and on-wafer measurement subsystems connected through the LAN. Successful preliminary applications of this system are demonstrated for improved T-shaped 0.1 mu m length gate formation and an amplifier designed using this improved simulation model. The system and its advantages are described.<>
Keywords :
MMIC; circuit layout CAD; electron beam lithography; field effect integrated circuits; microwave amplifiers; 100 nm; LAN; MMIC design system; T-shaped 0.1 mu m length gate formation; amplifier; electron beam direct drawing; electron direct write; microwave simulation; monolithic microwave ICs; on-wafer measurement subsystems; Circuit simulation; Computational modeling; Electrodes; Electron beams; Gallium arsenide; Instruments; MMICs; Noise measurement; Semiconductor device modeling; Voltage;
Conference_Titel :
Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1990. Technical Digest 1990., 12th Annual
Conference_Location :
New Orleans, LA, USA
DOI :
10.1109/GAAS.1990.175453
