• DocumentCode
    2816851
  • Title

    Reliability analysis of GaAs/AlGaAs HBTs under forward current/temperature stress

  • Author

    Hafizi, M.E. ; Pawlowicz, L.M. ; Tran, L.T. ; Umemoto, D.K. ; Streit, D.C. ; Oki, A.K. ; Kim, M.E. ; Yen, K.H.

  • Author_Institution
    TRW Inc., Redondo Beach, CA, USA
  • fYear
    1990
  • fDate
    7-10 Oct. 1990
  • Firstpage
    329
  • Lastpage
    332
  • Abstract
    The reliability of GaAs/AlGaAs heterojunction bipolar transistors is investigated by accelerated life-testing of discrete devices under forward bias stress at elevated temperatures. The DC device characteristics are monitored to evaluate the effect of bias/temperature stress on a large number of devices fabricated on MBE (molecular beam epitaxy) grown material. The primary degradation observed in some devices is a reduction in the current gain which appears to be due to an electric field-aided diffusion of interstitial Be from the base into the base-emitter graded region. Other devices with optimal epitaxial material show stable current gain after DC bias stress at high temperature. Ohmic contact degradation, with or without bias, is also observed at the emitter contact, resulting in an increased emitter series resistance.<>
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; heterojunction bipolar transistors; life testing; molecular beam epitaxial growth; reliability; semiconductor device testing; GaAs-AlGaAs; HBTs; MBE; accelerated life-testing; base-emitter graded region; electric field-aided diffusion; elevated temperatures; emitter contact; emitter series resistance; forward current/temperature stress; heterojunction bipolar transistors; ohmic contacts; optimal epitaxial material; primary degradation; reliability; Acceleration; Contact resistance; Degradation; Gallium arsenide; Heterojunction bipolar transistors; Molecular beam epitaxial growth; Monitoring; Ohmic contacts; Stress; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1990. Technical Digest 1990., 12th Annual
  • Conference_Location
    New Orleans, LA, USA
  • Type

    conf

  • DOI
    10.1109/GAAS.1990.175521
  • Filename
    175521