Title :
Reliability analysis of GaAs/AlGaAs HBTs under forward current/temperature stress
Author :
Hafizi, M.E. ; Pawlowicz, L.M. ; Tran, L.T. ; Umemoto, D.K. ; Streit, D.C. ; Oki, A.K. ; Kim, M.E. ; Yen, K.H.
Author_Institution :
TRW Inc., Redondo Beach, CA, USA
Abstract :
The reliability of GaAs/AlGaAs heterojunction bipolar transistors is investigated by accelerated life-testing of discrete devices under forward bias stress at elevated temperatures. The DC device characteristics are monitored to evaluate the effect of bias/temperature stress on a large number of devices fabricated on MBE (molecular beam epitaxy) grown material. The primary degradation observed in some devices is a reduction in the current gain which appears to be due to an electric field-aided diffusion of interstitial Be from the base into the base-emitter graded region. Other devices with optimal epitaxial material show stable current gain after DC bias stress at high temperature. Ohmic contact degradation, with or without bias, is also observed at the emitter contact, resulting in an increased emitter series resistance.<>
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; heterojunction bipolar transistors; life testing; molecular beam epitaxial growth; reliability; semiconductor device testing; GaAs-AlGaAs; HBTs; MBE; accelerated life-testing; base-emitter graded region; electric field-aided diffusion; elevated temperatures; emitter contact; emitter series resistance; forward current/temperature stress; heterojunction bipolar transistors; ohmic contacts; optimal epitaxial material; primary degradation; reliability; Acceleration; Contact resistance; Degradation; Gallium arsenide; Heterojunction bipolar transistors; Molecular beam epitaxial growth; Monitoring; Ohmic contacts; Stress; Temperature;
Conference_Titel :
Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1990. Technical Digest 1990., 12th Annual
Conference_Location :
New Orleans, LA, USA
DOI :
10.1109/GAAS.1990.175521