• DocumentCode
    2817926
  • Title

    Low-noise bias reliability of AlInAs/GaInAs MODFETs with linearly graded low-temperature buffer layers grown on GaAs substrates

  • Author

    Wakita, A.S. ; Rohdin, H. ; Robbins, V.M. ; Moll, N. ; Su, C.Y. ; Nagy, A. ; Basile, D.P.

  • Author_Institution
    Hewlett-Packard Co., Palo Alto, CA, USA
  • fYear
    1998
  • fDate
    11-15 May 1998
  • Firstpage
    223
  • Lastpage
    226
  • Abstract
    AlInAs/GaInAs MODEETs lattice-matched to InP have been shown to be reliable at low bias (Vds=0.75 to IV) for low-noise applications. Mean-times to failure (MTTF) from 105 to 107 hrs., based on various failure criteria, have been reported for lattice-matched FETs. To improve manufacturability of these FETs we have fabricated 0.1 μm T-gate AlInAs/GaInAs MODFETs on mismatched GaAs substrates by the insertion of a compositionally linearly graded low-temperature buffer (LGLTB) layer. In this work, we demonstrate that such FETs show comparable reliability at low bias under high temperature operating life (HTOL) tests to FETs on InP. Although the LGLTB layer is highly defective, there is no indication that the low-bias reliability of these devices is compromised. Our AlInAs/GaInAs MODFETS, grown on GaAs, have an extrapolated MTTF, based on Idss drift, exceeding 106 hours at a channel temperature of 125°C
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor device reliability; semiconductor epitaxial layers; AlInAs-GaInAs; GaAs; GaAs substrates; MODFET; high temperature operating life tests; lattice-matched FETs; linearly graded low-temperature buffer layers; low-noise bias reliability; reliability; Buffer layers; FETs; Gallium arsenide; HEMTs; Indium phosphide; MODFETs; Manufacturing; Molecular beam epitaxial growth; Substrates; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1998 International Conference on
  • Conference_Location
    Tsukuba
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-4220-8
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1998.712442
  • Filename
    712442