DocumentCode
2818190
Title
UV-250 patterning of sub-micron tapered active layers
Author
Tregoat, D. ; Colson, V. ; Coquard, J. ; le Gouezigou, L. ; Lestra, A. ; Pinquier, A. ; Poingt, F. ; Fernier, B.
Author_Institution
Alcatel Alsthom Corp. Res. Centre, Marcoussis, France
fYear
1998
fDate
11-15 May 1998
Firstpage
284
Lastpage
287
Abstract
This paper reports the first results on Fabry-Perot 1.3 μm lasers with sub-micron tapered active layers defined using a UV-250 patterning technology in combination with conventional RIE processing of InP. Its implementation to the full 2 inch wafer process flow is of interest in low cost module fabrication. Short lasers (500 μm) with low coupling loss (3.4 dB with end cleaved fiber) and high quantum efficiency (0.26 W/A at 85°C) are demonstrated
Keywords
quantum well lasers; sputter etching; ultraviolet lithography; 1.3 mum; 2 inch wafer process flow; 500 mum; 85 degC; Fabry-Perot lasers; InP; RIE processing; UV-250 patterning; coupling loss; low cost module fabrication; quantum efficiency; short lasers; sub-micron tapered active layers; Chemical technology; Costs; Fabry-Perot; Fiber lasers; Laser modes; Optical coupling; Optical device fabrication; Optical fibers; Resists; Waveguide lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 1998 International Conference on
Conference_Location
Tsukuba
ISSN
1092-8669
Print_ISBN
0-7803-4220-8
Type
conf
DOI
10.1109/ICIPRM.1998.712458
Filename
712458
Link To Document