DocumentCode
2818337
Title
Efficacy of the Thermalized Effective Potential Approach for Modeling Nano-Devices
Author
Ahmed, Shaikh S. ; Ringhofer, C. ; Vasileska, D.
Author_Institution
Department of Electrical and Computer Engineering, Purdue University, West Lafayette, IN
fYear
2005
fDate
01-03 Sept. 2005
Firstpage
251
Lastpage
254
Abstract
The efficacy of the thermalized parameter-free effective potential approach described elsewhere is examined with regard to its application to modeling of alternative device technologies. Our investigations suggest that the Hartree correction is significant only for very high doping densities, as it is the case in deca-nano MOSFETs. For low doping densities, as it is usually the case in alternative device structures, such as dual-gate and FinFET devices, the Hartree term can be neglected and the Barrier term needs to be included in the model only. Since the Barrier field is pre-calculated in the initialization stages of device simulation, it does not add any additional computational cost, thus leading to a very effective way of including quantum mechanical space-quantization effects in the computational model.
Keywords
Computational modeling; Doping; FinFETs; Mathematical model; Nanoscale devices; Quantization; Quantum computing; Schrodinger equation; Semiconductor process modeling; Thermal engineering;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices, 2005. SISPAD 2005. International Conference on
Print_ISBN
4-9902762-0-5
Type
conf
DOI
10.1109/SISPAD.2005.201520
Filename
1562072
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