DocumentCode :
2818337
Title :
Efficacy of the Thermalized Effective Potential Approach for Modeling Nano-Devices
Author :
Ahmed, Shaikh S. ; Ringhofer, C. ; Vasileska, D.
Author_Institution :
Department of Electrical and Computer Engineering, Purdue University, West Lafayette, IN
fYear :
2005
fDate :
01-03 Sept. 2005
Firstpage :
251
Lastpage :
254
Abstract :
The efficacy of the thermalized parameter-free effective potential approach described elsewhere is examined with regard to its application to modeling of alternative device technologies. Our investigations suggest that the Hartree correction is significant only for very high doping densities, as it is the case in deca-nano MOSFETs. For low doping densities, as it is usually the case in alternative device structures, such as dual-gate and FinFET devices, the Hartree term can be neglected and the Barrier term needs to be included in the model only. Since the Barrier field is pre-calculated in the initialization stages of device simulation, it does not add any additional computational cost, thus leading to a very effective way of including quantum mechanical space-quantization effects in the computational model.
Keywords :
Computational modeling; Doping; FinFETs; Mathematical model; Nanoscale devices; Quantization; Quantum computing; Schrodinger equation; Semiconductor process modeling; Thermal engineering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2005. SISPAD 2005. International Conference on
Print_ISBN :
4-9902762-0-5
Type :
conf
DOI :
10.1109/SISPAD.2005.201520
Filename :
1562072
Link To Document :
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