• DocumentCode
    2818337
  • Title

    Efficacy of the Thermalized Effective Potential Approach for Modeling Nano-Devices

  • Author

    Ahmed, Shaikh S. ; Ringhofer, C. ; Vasileska, D.

  • Author_Institution
    Department of Electrical and Computer Engineering, Purdue University, West Lafayette, IN
  • fYear
    2005
  • fDate
    01-03 Sept. 2005
  • Firstpage
    251
  • Lastpage
    254
  • Abstract
    The efficacy of the thermalized parameter-free effective potential approach described elsewhere is examined with regard to its application to modeling of alternative device technologies. Our investigations suggest that the Hartree correction is significant only for very high doping densities, as it is the case in deca-nano MOSFETs. For low doping densities, as it is usually the case in alternative device structures, such as dual-gate and FinFET devices, the Hartree term can be neglected and the Barrier term needs to be included in the model only. Since the Barrier field is pre-calculated in the initialization stages of device simulation, it does not add any additional computational cost, thus leading to a very effective way of including quantum mechanical space-quantization effects in the computational model.
  • Keywords
    Computational modeling; Doping; FinFETs; Mathematical model; Nanoscale devices; Quantization; Quantum computing; Schrodinger equation; Semiconductor process modeling; Thermal engineering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 2005. SISPAD 2005. International Conference on
  • Print_ISBN
    4-9902762-0-5
  • Type

    conf

  • DOI
    10.1109/SISPAD.2005.201520
  • Filename
    1562072