DocumentCode :
281917
Title :
Advances in submicron bipolar technology-current status and future prospects
Author :
Hunt, P.C.
Author_Institution :
Plessey Res. Caswell Ltd., Towcester, UK
fYear :
1989
fDate :
32637
Firstpage :
42370
Lastpage :
42376
Abstract :
Bipolar circuit operation at above 10 GHz has now been demonstrated by several companies. The current state of the art is an advanced double polysilicon structure using one micron feature sizes and submicron effective emitter widths. In the future as device dimensions are reduced down to the half micron level and below, the current device structure will be abandoned due to scaling limitations. A discussion of the future devices outlining two possible alternate structures is given
Keywords :
bipolar integrated circuits; integrated circuit technology; 1 micron; advanced double polysilicon structure; circuit operation; current device structure; device dimensions; feature sizes; scaling; submicron bipolar technology; submicron effective emitter widths;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Sub-Micron Silicon Engineering, IEE Colloquium on
Conference_Location :
London
Type :
conf
Filename :
198406
Link To Document :
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