DocumentCode :
2820150
Title :
Advanced Heterogeneous Integration of InP HBT and CMOS Si Technologies
Author :
Gutierrez-Aitken, Augusto ; Chang-Chien, Patty ; Scott, Dennis ; Hennig, Kelly ; Kaneshiro, Eric ; Nam, Peter ; Cohen, Neir ; Ching, Daniel ; Thai, Khanh ; Oyama, Bert ; Zhou, Joe ; Geiger, Craig ; Poust, Ben ; Parlee, Matthew ; Sandhu, Randy ; Phan, Wen
Author_Institution :
Northrop Grumman Aerosp. Syst., Redondo Beach, CA, USA
fYear :
2010
fDate :
3-6 Oct. 2010
Firstpage :
1
Lastpage :
4
Abstract :
Northrop Grumman Aerospace Systems (NGAS) is developing an Advanced Heterogeneous Integration (AHI) process to integrate III-V semiconductor chiplets on CMOS wafers under the Compound Semiconductor Materials on Silicon (COSMOS) DARPA program. The objective of the program is to have a heterogeneous interconnect pitch and length less than 5 um to enable intimate transistor scale integration. This integration will enable significant improvement in dynamic range and bandwidth of high performance mixed signal circuits.
Keywords :
CMOS analogue integrated circuits; III-V semiconductors; elemental semiconductors; heterojunction bipolar transistors; indium compounds; silicon; AHI process; CMOS Si technology; III-V semiconductor chiplet; InP HBT; advanced heterogeneous integration; compound semiconductor material; silicon; CMOS integrated circuits; Compounds; Differential amplifiers; Heterojunction bipolar transistors; Indium phosphide; Resistance; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductor Integrated Circuit Symposium (CSICS), 2010 IEEE
Conference_Location :
Monterey, CA
ISSN :
1550-8781
Print_ISBN :
978-1-4244-7437-0
Electronic_ISBN :
1550-8781
Type :
conf
DOI :
10.1109/CSICS.2010.5619667
Filename :
5619667
Link To Document :
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