DocumentCode :
2821569
Title :
On-wafer calibration techniques for giga-hertz CMOS measurements
Author :
Kolding, Troels Emil
Author_Institution :
RF Integrated Syst. & Circuits Group, Aalborg Univ., Denmark
fYear :
1999
fDate :
1999
Firstpage :
105
Lastpage :
110
Abstract :
This paper presents five different methods for performing on-wafer calibration of RF CMOS measurements. All methods are compatible with standard CMOS technology. A comparison of method performance up to 12 GHz is made with measurements on RF CMOS devices. The results verify that substrate and metallization losses must be considered to obtain high accuracy. Fixture design issues are discussed and a method for mitigating overestimation of DUT performance is suggested
Keywords :
CMOS integrated circuits; calibration; field effect MMIC; integrated circuit interconnections; integrated circuit measurement; integrated circuit metallisation; losses; 12 GHz; CMOS measurements; CMOS technology; DUT performance overestimation; RF CMOS device measurements; RF CMOS measurements; fixture design issues; measurement method performance; metallization losses; on-wafer calibration; on-wafer calibration techniques; substrate losses; CMOS process; CMOS technology; Calibration; Fixtures; Integrated circuit measurements; Microwave devices; Performance evaluation; Radio frequency; Semiconductor device modeling; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 1999. ICMTS 1999. Proceedings of the 1999 International Conference on
Conference_Location :
Goteborg
Print_ISBN :
0-7803-5270-X
Type :
conf
DOI :
10.1109/ICMTS.1999.766225
Filename :
766225
Link To Document :
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