• DocumentCode
    28223
  • Title

    Current Stability in Multi-Mesa-Channel AlGaN/GaN HEMTs

  • Author

    Ohi, Kota ; Asubar, Joel Tacla ; Nishiguchi, Kenji ; Hashizume, Takumi

  • Author_Institution
    Res. Center for Integrated Quantum Electron., Hokkaido Univ., Sapporo, Japan
  • Volume
    60
  • Issue
    10
  • fYear
    2013
  • fDate
    Oct. 2013
  • Firstpage
    2997
  • Lastpage
    3004
  • Abstract
    We develop and characterize multi-mesa-channel (MMC) AlGaN/GaN high-electron mobility transistors (HEMTs), in which a periodic trench structure is fabricated only under the gate electrode. A surrounding-field effect in the MMC structure results in a shallower threshold voltage and a smaller subthreshold slope than those of the standard planar-type HEMT. In addition, the MMC HEMT shows a low knee voltage and a weak dependence of on-resistance (RON) on the gate-drain distance. Following identical off-state bias stress, the MMC HEMT exhibits low current collapse. The relative decrease in access resistance of the MMC device compared with the planar device can reduce the effects of access resistance on the drain current. It is likely that a high impedance of each nanochannel also contributes to the current stability of the MMC HEMT.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; stability; wide band gap semiconductors; AlGaN-GaN; MMC high-electron mobility transistors; MMC structure; access resistance; current stability; drain current; gate electrode; gate-drain distance; identical off-state bias stress; low current collapse; low knee voltage; multimesa-channel HEMTs; nanochannel; periodic trench structure; planar-type HEMT device; subthreshold slope; surrounding-field effect; threshold voltage; Aluminum gallium nitride; Gallium nitride; HEMTs; Logic gates; MODFETs; Stress; Threshold voltage; Access resistance; GaN; current collapse; high-electron mobility transistor (HEMT); multi-mesa-channel (MMC); off-state stress; subthreshold slope; threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2013.2266663
  • Filename
    6555829