• DocumentCode
    2825643
  • Title

    Understanding the impact of equipment and process changes with a heterogeneous semiconductor manufacturing simulation environment

  • Author

    Herrmann, Jeffrey W. ; Conaghan, Brian F. ; Henn-Lecordier, Laurent ; Mellacheruvu, Praveen ; Nguyen, Manh-Quan ; Rubloff, Gary W. ; Shi, Rock Z.

  • Author_Institution
    Inst. for Syst. Res., Maryland Univ., College Park, MD, USA
  • Volume
    2
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    1491
  • Abstract
    Simulation models are useful to predict and understand the impact of changes to a manufacturing system. Typical factory simulation models include the parts being manufactured in the factory and the people and resources processing and handling the parts. However, these models do not include equipment or process details, which can affect operational performance such as cycle time and inventory. Separate models are used to evaluate processes and equipment. Thus, it is difficult to evaluate the operational impact of equipment or process changes. However, this information could help factory managers and manufacturing process engineers make better decisions when changing processes or selecting equipment configurations. This paper describes a heterogeneous simulation environment for understanding how equipment and process changes affect the performance of a wafer fabrication facility. This integrated tool incorporates response surface models that describe process behavior, operational and optimization models of equipment behavior, and a discrete event simulation model of factory operations. Thus, the tool can measure how process changes and equipment configuration changes change the system performance. We have applied this tool to a specific wafer fab problem
  • Keywords
    computer integrated manufacturing; discrete event simulation; optimisation; semiconductor device manufacture; cycle time; discrete event simulation; equipment change; factory simulation models; heterogeneous simulation environment; inventory; operational performance; optimization models; process change; response surface models; semiconductor manufacturing simulation; wafer fabrication facility; Discrete event simulation; Engineering management; Fabrication; Manufacturing processes; Manufacturing systems; Predictive models; Production facilities; Response surface methodology; Semiconductor device modeling; Virtual manufacturing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation Conference, 2000. Proceedings. Winter
  • Conference_Location
    Orlando, FL
  • Print_ISBN
    0-7803-6579-8
  • Type

    conf

  • DOI
    10.1109/WSC.2000.899130
  • Filename
    899130