DocumentCode :
2825697
Title :
A simulation-based cost modeling methodology for evaluation of interbay material handling in a semiconductor wafer fab
Author :
Murray, Shari ; Mackulak, Gerald T. ; Fowler, John W. ; Colvin, Theron
Author_Institution :
Dept. of Ind. Eng., Arizona State Univ., Tempe, AZ, USA
Volume :
2
fYear :
2000
fDate :
2000
Firstpage :
1510
Abstract :
In the next generation of semiconductor wafer fabrication facilities, decisions concerning material handling systems will be a major factor in initial facility cost, operational cost, production cycle times and possibly product yield percentages. The wafers will increase in diameter to 300 mm and a new front opening unified pod (FOUP) has been designed to carry them, both increasing the weight of a production lot. This increase requires substantial automation for ergonomic and quality reasons. As a result, semiconductor manufacturers are asking, “what level of automation is financially justifiable?” Automation suppliers have stated that automation saves money, but have as yet not produced a sufficiently detailed financial analysis proving their premise. In this paper, both a fully automated and a manual material handling system are simulated and compared in a thorough cost analysis. Sensitivity analysis is performed on inflation rate, interest rate, die price, wafer start rate, and yield percentage to validate the results of the analyses
Keywords :
computer integrated manufacturing; costing; digital simulation; financial data processing; materials handling; semiconductor device manufacture; die price; ergonomics; facility cost; financial analysis; front opening unified pod; inflation rate; interbay material handling; interest rate; operational cost; product yield percentages; production cycle times; semiconductor manufacturing simulation; semiconductor wafer fabrication; sensitivity analysis; simulation-based cost modeling; wafer start rate; Analytical models; Costs; Ergonomics; Fabrication; Manufacturing automation; Materials handling; Production systems; Semiconductor device manufacture; Semiconductor device modeling; Sensitivity analysis;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation Conference, 2000. Proceedings. Winter
Conference_Location :
Orlando, FL
Print_ISBN :
0-7803-6579-8
Type :
conf
DOI :
10.1109/WSC.2000.899133
Filename :
899133
Link To Document :
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