• DocumentCode
    2828888
  • Title

    Possible observation of ballistic contact resistance in wide Si MOSFETs

  • Author

    Majumdar, Amlan ; Antoniadis, Dimitri A.

  • Author_Institution
    Res. Div., T.J. Watson Res. Center, IBM, Yorktown Heights, NY, USA
  • fYear
    2012
  • fDate
    18-20 June 2012
  • Firstpage
    197
  • Lastpage
    198
  • Abstract
    In conclusion, using a comparison of our experimental data of REXT versus NS and T to the ballistic FET theory, we have presented experimental evidence on the possible observation of ballistic contact resistance RB in wide-channel Si MOSFETs. Finally, we note that the ballistic contact resistance RB represents the ultimate limit of total series resistance REXT [8]. This limit for (100) Si is ~ 40 Ω.μm for NFETs and ~ 70 Ω.μm for PFETs at NS = 1 × 1013 cm-2. Furthermore, this limit of REXT is ~ 55 Ω.μm for III-V NFETs at NS = 1 × 1013 cm-2 with isotropic effective mass m*/m0 in the 0.02-0.1 range. The value of RB is slightly higher for III-V NFETs than that for Si NFETs because lower m* and lower valley degeneracy lead to lower number of conducting transverse modes.
  • Keywords
    MOSFET; contact resistance; elemental semiconductors; field effect transistors; silicon; III-V NFET; MOSFET; Si; ballistic contact resistance; metal-oxide-semiconductor field effect transistors; Contact resistance; Logic gates; MOSFETs; Resistance; Silicon; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference (DRC), 2012 70th Annual
  • Conference_Location
    University Park, TX
  • ISSN
    1548-3770
  • Print_ISBN
    978-1-4673-1163-2
  • Type

    conf

  • DOI
    10.1109/DRC.2012.6256989
  • Filename
    6256989