DocumentCode
2828888
Title
Possible observation of ballistic contact resistance in wide Si MOSFETs
Author
Majumdar, Amlan ; Antoniadis, Dimitri A.
Author_Institution
Res. Div., T.J. Watson Res. Center, IBM, Yorktown Heights, NY, USA
fYear
2012
fDate
18-20 June 2012
Firstpage
197
Lastpage
198
Abstract
In conclusion, using a comparison of our experimental data of REXT versus NS and T to the ballistic FET theory, we have presented experimental evidence on the possible observation of ballistic contact resistance RB in wide-channel Si MOSFETs. Finally, we note that the ballistic contact resistance RB represents the ultimate limit of total series resistance REXT [8]. This limit for (100) Si is ~ 40 Ω.μm for NFETs and ~ 70 Ω.μm for PFETs at NS = 1 × 1013 cm-2. Furthermore, this limit of REXT is ~ 55 Ω.μm for III-V NFETs at NS = 1 × 1013 cm-2 with isotropic effective mass m*/m0 in the 0.02-0.1 range. The value of RB is slightly higher for III-V NFETs than that for Si NFETs because lower m* and lower valley degeneracy lead to lower number of conducting transverse modes.
Keywords
MOSFET; contact resistance; elemental semiconductors; field effect transistors; silicon; III-V NFET; MOSFET; Si; ballistic contact resistance; metal-oxide-semiconductor field effect transistors; Contact resistance; Logic gates; MOSFETs; Resistance; Silicon; Temperature measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference (DRC), 2012 70th Annual
Conference_Location
University Park, TX
ISSN
1548-3770
Print_ISBN
978-1-4673-1163-2
Type
conf
DOI
10.1109/DRC.2012.6256989
Filename
6256989
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