DocumentCode :
2829767
Title :
Exclusive electrical determination of high-resistance grain-boundaries in poly-graphene
Author :
Chen, Ruiyi ; Das, Suprem R. ; Jeong, Changwook ; Janes, David B. ; Alam, Muhammad A.
Author_Institution :
Purdue Univ., West Lafayette, IN, USA
fYear :
2012
fDate :
18-20 June 2012
Firstpage :
57
Lastpage :
58
Abstract :
Single layer graphene (SLG), with high optical transparency and electrical conductivity, may potentially be used as flexible transparent electrode in photovoltaics, photo detectors, and flat panel displays. While its optical transmittance exceeds 95% (significantly better than most traditional materials), its sheet resistance (ρpoly-G) must be reduced below 10-20Ω/□ for viable replacement of present Transparent Conducting Oxides (TCOs) like Indium doped Tin Oxide (ITO). However, large scale CVD SLG is typically polycrystalline, consisting of many grains, with neighboring grains separated by high- and low-resistance grain boundaries (HGB and LGB), see Fig. 1 and 7. The HGBs severely limit the (percolating) electronic transport, so that ρpoly-G>; 1000Ω/□. It is therefore important to determine the electronic nature and fraction of HGB to improve transport in polycrystalline SLG.
Keywords :
grain boundaries; graphene; electrical conductivity; electronic transport; flat panel displays; flexible transparent electrode; high-resistance grain-boundaries; indium doped tin oxide; optical transmittance; optical transparency; photo detectors; photovoltaics; poly-graphene; polycrystalline; sheet resistance; single layer graphene; transparent conducting oxides; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference (DRC), 2012 70th Annual
Conference_Location :
University Park, TX
ISSN :
1548-3770
Print_ISBN :
978-1-4673-1163-2
Type :
conf
DOI :
10.1109/DRC.2012.6257034
Filename :
6257034
Link To Document :
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