DocumentCode :
2829818
Title :
Methods for attaining high interband tunneling current in III-Nitrides
Author :
Growden, Tyler A. ; Krishnamoorthy, Sriram ; Nath, Digbijoy N. ; Ramesh, Anisha ; Rajan, Siddharth ; Berger, Paul R.
Author_Institution :
Dept. of Electr. & Comput. Eng., Ohio State Univ., Columbus, OH, USA
fYear :
2012
fDate :
18-20 June 2012
Firstpage :
163
Lastpage :
164
Abstract :
In conclusion, the authors have reported an increase in forward interband tunneling current density from 17.7 A/cm2 [2] to 39.8 kA/cm2 by applying outside AIGaN confmement barriers and 6-doping to a common structure. Some of the devices still exhibit hysteresis effects caused by traps, but some seem to display less of an effect, which needs to be studied further to provide stability. Optimization of the barrier thickness and Indium composition must also be performed to continue to push the peak current density up in value
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; indium; tunnel diodes; tunnelling; wide band gap semiconductors; AlGaN; confmement barriers; forward interband tunneling current density; high interband tunneling current; hysteresis effects; traps;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference (DRC), 2012 70th Annual
Conference_Location :
University Park, TX
ISSN :
1548-3770
Print_ISBN :
978-1-4673-1163-2
Type :
conf
DOI :
10.1109/DRC.2012.6257036
Filename :
6257036
Link To Document :
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