• DocumentCode
    283500
  • Title

    A novel strained quantum well laser emitting at 1.5 μm

  • Author

    Tothill, J.N. ; Monserrat, K.J. ; Hatch, C.B. ; Henning, I.D.

  • Author_Institution
    British Telecom Res. Labs., Martlesham Heath, UK
  • fYear
    1988
  • fDate
    32443
  • Firstpage
    42461
  • Lastpage
    42463
  • Abstract
    The authors have grown a laser structure based on a InxGa1-xAs/InyGa1-yAs strained layer superlattice active region which emits at ~1.55 μm. An active region thickness of 44 nm gave the lowest threshold current density, Jth. This value of Jth is over an order of magnitude better than would have been obtained using a similar InGaAsP active layer thickness. This reduction in Jth for this thickness of active layer must be due to a reduction in the Auger processes. The high efficiency observed implies a reduction in optical losses. The lasers are considered for long haul telecommunications
  • Keywords
    III-V semiconductors; gallium arsenide; indium compounds; optical communication equipment; semiconductor junction lasers; semiconductor quantum wells; 1.5 micron; 1.55 micron; Auger processes; InxGa1-xAs-InyGa1-yAs; active region thickness; high efficiency; long haul telecommunications; reduction in optical losses; strained layer superlattice active region; strained quantum well laser emitting; threshold current density;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Heterojunction and Quantym Well Devices: Physics, Engineering and Applications, IEE Colloquium on
  • Conference_Location
    London
  • Type

    conf

  • Filename
    209516