Title :
All-solid-source MBE growth of AlGaInAsP-based optoelectronic devices
Author :
Pessa, M. ; Toivonen, M. ; Savolainen, P. ; Kongas, J. ; Murison, R. ; Panarello, T. ; Nabiev, R.F. ; Jansen, M. ; Corvini, P.
Author_Institution :
Dept. of Phys., Tampere Univ. of Technol., Finland
Abstract :
All-solid source molecular beam epitaxy, SS-MBE, has opened the possibility of growing GaInAsP and AlGaInP semiconductors over a wide band-gap range without use of toxic gases as source materials. In particular, the key discovery facilitating a controlled alloying of phosphorus with other elements has been the development of multi-zone P 2 cells. With these cells one can couple ease of solid material handling with a long source material lifetime and convenient flux control previously only available with gaseous sources. In this paper, we concentrate on phosphorus containing lasers and super-bright resonant-cavity light emitting diodes (RC-LEDs), grown by SS-MBE on InP or GaAs substrates. The lasers discussed cover a spectral region from 630 nm to 1300 nm; the RC-LED´s emit at 670 nm and 1300 nm. Their performance characteristics, including reliability data, will be presented
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; indium compounds; laser reliability; molecular beam epitaxial growth; quantum well lasers; semiconductor device reliability; semiconductor epitaxial layers; semiconductor growth; superluminescent diodes; 630 to 1300 nm; AlGaInAsP-based optoelectronic devices; InP; all-solid-source MBE growth; controlled alloying; multi-zone P2 cells; performance characteristics; phosphorus containing lasers; quantum well LD; reliability data; super-bright resonant-cavity LED; wide band-gap range; Alloying; Gas lasers; Gases; Materials handling; Molecular beam epitaxial growth; Optical materials; Photonic band gap; Resonance; Semiconductor materials; Solids;
Conference_Titel :
Indium Phosphide and Related Materials, 1998 International Conference on
Conference_Location :
Tsukuba
Print_ISBN :
0-7803-4220-8
DOI :
10.1109/ICIPRM.1998.712555