DocumentCode :
2837017
Title :
Impact of lithographic irregularity across mm-scale photonic-crystal notch filters
Author :
Talneau, A. ; Lemarchand, F. ; Fehrembach, A.-L. ; Sentenac, A.
Author_Institution :
Lab. de Photonique et de Nanostruct., CNRS, Marcoussis, France
fYear :
2009
fDate :
14-19 June 2009
Firstpage :
1
Lastpage :
1
Abstract :
We investigate the impact of electronic lithography writing conditions on the performances of two-dimensional grating notch filters fabricated on SiO2/Ta2O5 stack. Field stitching errors as well as electron beam writing step are considered.
Keywords :
diffraction gratings; electron beam lithography; optical fabrication; optical filters; photonic crystals; silicon compounds; tantalum compounds; SiO2-Ta2O5; electron beam writing step; electronic lithographic irregularity; field stitching errors; photonic-crystal notch filters; two-dimensional grating notch filter fabrication; Calibration; Electron beams; Gratings; Lithography; Nanopatterning; Nanostructures; Optical filters; Optical reflection; Resonance; Writing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location :
Munich
Print_ISBN :
978-1-4244-4079-5
Electronic_ISBN :
978-1-4244-4080-1
Type :
conf
DOI :
10.1109/CLEOE-EQEC.2009.5194810
Filename :
5194810
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2837017
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