DocumentCode :
2838796
Title :
Laser/waveguide integration utilizing selective area MOMBE regrowth for photonic IC applications
Author :
Kunzel, H. ; Ebert, S. ; Gibis, R. ; Harde, P. ; Kaiser, R. ; Kizuki, H. ; Malchow, S.
Author_Institution :
Heinrich-Hertz-Inst. fur Nachrichtentech. Berlin GmbH, Germany
fYear :
1998
fDate :
11-15 May 1998
Firstpage :
571
Lastpage :
574
Abstract :
The potential of metal organic MBE for selective deposition of InP/GaInAsP passive optical waveguide structures was studied for butt coupling with an active laser waveguide. By use of appropriate ex-situ and in-situ preparation procedures of the masked laser surfaces and high V/III ratios during regrowth virtually ideal butt-joints without any significant deterioration of the topography near the lateral interface and minimum lateral separation between the active and the passive waveguide were achieved. In addition, besides the absence of gas phase pre-reactions during MOMBE, careful ex-situ surface cleaning helped to reduce the growth temperature to as low as 485°C without loss of selectivity. Such a low deposition temperature results in suppression of dopant movement during growth of semi-insulating Fe doped waveguides. SIMS measurements revealed laterally homogeneous incorporation behaviour of the Fe dopant in the waveguide layers without any accumulation at the lateral laser/waveguide interface as well as any detectable Fe indiffusion into the laser region. Device quality of the deposition process was evaluated from the characteristics of Fabry-Perot lasers comprising an active and a passive waveguide section. Only a small increase of the threshold current by some 30% for a 600 μm long passive section as compared to a bare laser demonstrates the applicability of the fabricated butt-joint in photonic ICs. Butt coupling efficiencies of(62±12)% for 3 μm wide structures have been determined from measuring the threshold current as function of the passive waveguide length
Keywords :
III-V semiconductors; chemical beam epitaxial growth; gallium arsenide; gallium compounds; indium compounds; iron; optical planar waveguides; secondary ion mass spectra; semiconductor epitaxial layers; semiconductor growth; semiconductor lasers; surface cleaning; 485 degC; Fabry-Perot lasers; InP-InGaAsP:Fe; SIMS; V/III ratio; active laser waveguide; butt coupling; growth temperature; indiffusion; laser/waveguide integration; lateral interface; masked laser surfaces; passive optical waveguide structures; photonic IC; selective area MOMBE regrowth; selective deposition; semi-insulating Fe doped waveguides; surface cleaning; threshold current; Indium phosphide; Iron; Optical coupling; Optical surface waves; Optical waveguides; Surface cleaning; Surface topography; Temperature; Threshold current; Waveguide lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1998 International Conference on
Conference_Location :
Tsukuba
ISSN :
1092-8669
Print_ISBN :
0-7803-4220-8
Type :
conf
DOI :
10.1109/ICIPRM.1998.712656
Filename :
712656
Link To Document :
بازگشت