• DocumentCode
    2839798
  • Title

    Characterization of ultra-thin SOI MOSFETs by coupling effect between front and back interfaces

  • Author

    Ohata, A. ; Cristoioveanu, S. ; Cassé, M. ; Vandoorcn, A. ; Daugé, F.

  • Author_Institution
    IMEP ENSERG, Grenoble, France
  • fYear
    2005
  • fDate
    3-6 Oct. 2005
  • Firstpage
    63
  • Lastpage
    64
  • Abstract
    By investigating the coupling effect between the front and back channels of ultra-thin SOI-MOSFETs, the mobility enhancement by volume inversion, the channel separation between the front and back channels, and the impact of the SOI thickness are discussed. As a result, it is shown that a careful check is necessary for confirming which channel (front or back) is inverted in a short device because the channel separation is difficult in transconductance curves. Furthermore, it is shown that the SOI thickness depends on the device size and location, leading to a complex behavior.
  • Keywords
    MOSFET; carrier mobility; inversion layers; semiconductor device models; silicon-on-insulator; channel separation; coupling effect; silicon-on-insulator; ultra thin SOI MOSFET; volume inversion; Capacitance; Doping; Electric variables; Immune system; MOSFET circuits; Potential well; Semiconductor films; Silicon; Substrates; Transconductance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, 2005. Proceedings. 2005 IEEE International
  • ISSN
    1078-621X
  • Print_ISBN
    0-7803-9212-4
  • Type

    conf

  • DOI
    10.1109/SOI.2005.1563534
  • Filename
    1563534