Title :
Characterization of ultra-thin SOI MOSFETs by coupling effect between front and back interfaces
Author :
Ohata, A. ; Cristoioveanu, S. ; Cassé, M. ; Vandoorcn, A. ; Daugé, F.
Author_Institution :
IMEP ENSERG, Grenoble, France
Abstract :
By investigating the coupling effect between the front and back channels of ultra-thin SOI-MOSFETs, the mobility enhancement by volume inversion, the channel separation between the front and back channels, and the impact of the SOI thickness are discussed. As a result, it is shown that a careful check is necessary for confirming which channel (front or back) is inverted in a short device because the channel separation is difficult in transconductance curves. Furthermore, it is shown that the SOI thickness depends on the device size and location, leading to a complex behavior.
Keywords :
MOSFET; carrier mobility; inversion layers; semiconductor device models; silicon-on-insulator; channel separation; coupling effect; silicon-on-insulator; ultra thin SOI MOSFET; volume inversion; Capacitance; Doping; Electric variables; Immune system; MOSFET circuits; Potential well; Semiconductor films; Silicon; Substrates; Transconductance;
Conference_Titel :
SOI Conference, 2005. Proceedings. 2005 IEEE International
Print_ISBN :
0-7803-9212-4
DOI :
10.1109/SOI.2005.1563534