DocumentCode
2839798
Title
Characterization of ultra-thin SOI MOSFETs by coupling effect between front and back interfaces
Author
Ohata, A. ; Cristoioveanu, S. ; Cassé, M. ; Vandoorcn, A. ; Daugé, F.
Author_Institution
IMEP ENSERG, Grenoble, France
fYear
2005
fDate
3-6 Oct. 2005
Firstpage
63
Lastpage
64
Abstract
By investigating the coupling effect between the front and back channels of ultra-thin SOI-MOSFETs, the mobility enhancement by volume inversion, the channel separation between the front and back channels, and the impact of the SOI thickness are discussed. As a result, it is shown that a careful check is necessary for confirming which channel (front or back) is inverted in a short device because the channel separation is difficult in transconductance curves. Furthermore, it is shown that the SOI thickness depends on the device size and location, leading to a complex behavior.
Keywords
MOSFET; carrier mobility; inversion layers; semiconductor device models; silicon-on-insulator; channel separation; coupling effect; silicon-on-insulator; ultra thin SOI MOSFET; volume inversion; Capacitance; Doping; Electric variables; Immune system; MOSFET circuits; Potential well; Semiconductor films; Silicon; Substrates; Transconductance;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference, 2005. Proceedings. 2005 IEEE International
ISSN
1078-621X
Print_ISBN
0-7803-9212-4
Type
conf
DOI
10.1109/SOI.2005.1563534
Filename
1563534
Link To Document