Title : 
Unusual gate current transient behavior in SOI MOSFETs
         
        
            Author : 
Bawedin, M. ; Cristoloveanu, S. ; Flandre, D.
         
        
            Author_Institution : 
Microelectron. Lab., UCL, Louvain, Belgium
         
        
        
        
        
        
            Abstract : 
We report unusual gate current variations with gate bias and time in accumulation regime. Measurements and simulations show the importance of the time-dependent floating body potential in both partially and fully depleted SOI MOSFETs. These variations during front-gate voltage scan and the resulting transient gate current are discussed as a combination of several mechanisms such as capacitive coupling, SRH generation, band-to-band tunneling and impact ionization. The gate current behavior is important for EEPROMs and depends on the device geometry and operating conditions.
         
        
            Keywords : 
EPROM; MOSFET; silicon-on-insulator; EEPROM; SOI MOSFET; device geometry; floating body potential; front-gate voltage scan; gate current transient behavior; gate current variations; Current measurement; EPROM; Geometry; Impact ionization; Logic devices; MOSFETs; Performance evaluation; Tunneling; Voltage; Writing;
         
        
        
        
            Conference_Titel : 
SOI Conference, 2005. Proceedings. 2005 IEEE International
         
        
        
            Print_ISBN : 
0-7803-9212-4
         
        
        
            DOI : 
10.1109/SOI.2005.1563536