• DocumentCode
    2839823
  • Title

    Unusual gate current transient behavior in SOI MOSFETs

  • Author

    Bawedin, M. ; Cristoloveanu, S. ; Flandre, D.

  • Author_Institution
    Microelectron. Lab., UCL, Louvain, Belgium
  • fYear
    2005
  • fDate
    3-6 Oct. 2005
  • Firstpage
    67
  • Lastpage
    69
  • Abstract
    We report unusual gate current variations with gate bias and time in accumulation regime. Measurements and simulations show the importance of the time-dependent floating body potential in both partially and fully depleted SOI MOSFETs. These variations during front-gate voltage scan and the resulting transient gate current are discussed as a combination of several mechanisms such as capacitive coupling, SRH generation, band-to-band tunneling and impact ionization. The gate current behavior is important for EEPROMs and depends on the device geometry and operating conditions.
  • Keywords
    EPROM; MOSFET; silicon-on-insulator; EEPROM; SOI MOSFET; device geometry; floating body potential; front-gate voltage scan; gate current transient behavior; gate current variations; Current measurement; EPROM; Geometry; Impact ionization; Logic devices; MOSFETs; Performance evaluation; Tunneling; Voltage; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, 2005. Proceedings. 2005 IEEE International
  • ISSN
    1078-621X
  • Print_ISBN
    0-7803-9212-4
  • Type

    conf

  • DOI
    10.1109/SOI.2005.1563536
  • Filename
    1563536