DocumentCode
2840438
Title
A proposal for improving cutoff-frequency breakdown-voltage products of HEMTs
Author
Tsukurimichi, Hirokazu ; Hashimoto, Shoushin ; Iiyama, Kouichi ; Takamiya, Saburo
Author_Institution
Fac. of Eng., Kanazawa Univ., Japan
fYear
1998
fDate
11-15 May 1998
Firstpage
663
Lastpage
666
Abstract
The breakdown-voltage cutoff-frequency product gives a figure of merit of FETs/HEMTs. This paper studies it from a view point of energy-bandgaps of channel materials, and proposes a bandgap engineered device for improving the product. VB·fT of an InGaAs HEMT can be doubled by introducing a (InGaAs to InP) graded composition zone
Keywords
III-V semiconductors; energy gap; field effect transistors; gallium arsenide; high electron mobility transistors; indium compounds; HEMT; InGaAs-InP; bandgap engineered device; channel materials; energy-bandgaps; figure of merit; graded composition zone; improving cutoff-frequency breakdown-voltage products; Degradation; HEMTs; Indium gallium arsenide; Indium phosphide; Lattices; MODFETs; Photonic band gap; Power engineering and energy; Proposals; Semiconductor process modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 1998 International Conference on
Conference_Location
Tsukuba
ISSN
1092-8669
Print_ISBN
0-7803-4220-8
Type
conf
DOI
10.1109/ICIPRM.1998.712723
Filename
712723
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