DocumentCode :
2840613
Title :
Raman amplification and lasing in SiGe-on-insulator waveguides
Author :
Raghunathan, V. ; Claps, R. ; Boyraz, O. ; Koonath, P. ; Dimitropoulos, D. ; Jalali, B.
Author_Institution :
California Univ., Los Angeles, CA, USA
fYear :
2005
fDate :
3-6 Oct. 2005
Firstpage :
196
Lastpage :
197
Abstract :
Stimulated Raman scattering in SOI waveguides has received significant attention recently with the demonstration of pulsed, continuous wave Raman lasers and high gain Raman amplification. However, the limited bandwidth of the Raman signal in silicon (∼105GHz) renders this scheme unsuitable for broadband WDM amplification unless multi-pumping scheme is employed. Large pulsed gain and lasing have been reported in GeSi waveguides. The SiGe on SOI platform represents a Raman medium with a flexible gain spectrum.
Keywords :
Ge-Si alloys; Raman spectra; amplification; semiconductor lasers; silicon-on-insulator; waveguides; Raman amplification; Raman lasing; Raman signal; SOI waveguides; SiGe; SiGe-on-insulator waveguides; pulsed continuous wave Raman lasers; stimulated Raman scattering; Fiber nonlinear optics; Germanium silicon alloys; Nonlinear optics; Optical waveguides; Phonons; Pulse amplifiers; Raman scattering; Silicon germanium; Stimulated emission; Superlattices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, 2005. Proceedings. 2005 IEEE International
ISSN :
1078-621X
Print_ISBN :
0-7803-9212-4
Type :
conf
DOI :
10.1109/SOI.2005.1563586
Filename :
1563586
Link To Document :
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