Title :
Thermal hysteresis in quartz resonators-A review [frequency standards]
Author :
Kusters, John A. ; Vig, John R.
Author_Institution :
Hewlett Packard Co., Palo Alto, CA, USA
Abstract :
The subject of thermal hysteresis is reviewed. A review of the literature which deals with frequency vs pressure and frequency vs. temperature hysteresis is presented. Typical hysteresis curves are shown. Hysteresis mechanisms such as contamination redistribution, strain changes, and changes in the quartz are discussed. The results seem to indicate that lattice defects are somehow related to thermal hysteresis. Stress relief in the mounting structure can also produce significant hysteresis
Keywords :
crystal defects; crystal resonators; frequency measurement; hysteresis; measurement standards; reviews; thermal properties of substances; SiO2; contamination redistribution; frequency characteristics; frequency standard; lattice defects; mounting structure; pressure dependence; quartz resonators; strain changes; stress relief; temperature hysteresis; thermal hysteresis; Books; Capacitive sensors; Contracts; Frequency control; Hysteresis; Oscillators; Ovens; Resonant frequency; Stability; Temperature sensors;
Conference_Titel :
Frequency Control, 1990., Proceedings of the 44th Annual Symposium on
Conference_Location :
Baltimore, MD
DOI :
10.1109/FREQ.1990.177467
