DocumentCode
2840751
Title
Thermal hysteresis in quartz resonators-A review [frequency standards]
Author
Kusters, John A. ; Vig, John R.
Author_Institution
Hewlett Packard Co., Palo Alto, CA, USA
fYear
1990
fDate
23-25 May 1990
Firstpage
165
Lastpage
175
Abstract
The subject of thermal hysteresis is reviewed. A review of the literature which deals with frequency vs pressure and frequency vs. temperature hysteresis is presented. Typical hysteresis curves are shown. Hysteresis mechanisms such as contamination redistribution, strain changes, and changes in the quartz are discussed. The results seem to indicate that lattice defects are somehow related to thermal hysteresis. Stress relief in the mounting structure can also produce significant hysteresis
Keywords
crystal defects; crystal resonators; frequency measurement; hysteresis; measurement standards; reviews; thermal properties of substances; SiO2; contamination redistribution; frequency characteristics; frequency standard; lattice defects; mounting structure; pressure dependence; quartz resonators; strain changes; stress relief; temperature hysteresis; thermal hysteresis; Books; Capacitive sensors; Contracts; Frequency control; Hysteresis; Oscillators; Ovens; Resonant frequency; Stability; Temperature sensors;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency Control, 1990., Proceedings of the 44th Annual Symposium on
Conference_Location
Baltimore, MD
Type
conf
DOI
10.1109/FREQ.1990.177467
Filename
177467
Link To Document