• DocumentCode
    2841614
  • Title

    Electroless nickel/Immersion gold process on Aluminum alloy electrodes

  • Author

    Kawashima, Satoshi

  • Author_Institution
    Global Marketing Dept., Meltex Inc., Saitama, Japan
  • fYear
    2011
  • fDate
    19-21 Oct. 2011
  • Firstpage
    381
  • Lastpage
    384
  • Abstract
    Electronic equipment has changed to have higher performance with minimized in size. This trend required to electronic devices minimization also. Numerous packaging techniques have developed using metal flame, PWB material and plastic tape to mount semiconductor devices on PWB1). To achieve further high mounting density, the semiconductor device directly solder mounted on package after forming metal bumps on electrode of semiconductor devices. Aluminum alloy is common material for electrode of semiconductor devices, since it has relatively high conductivity, chemically stable and less reaction in semiconductor manufacturing process. However, it needs other meal layer for soldering to form bump on it. Sputtered Ti/Cu layer and electrolytic solder plating is widely used to form solder bump. However, this process requires longer and costly process such as multiple vacuum process, photo image process, etc.
  • Keywords
    aluminium alloys; electrodes; electronics packaging; semiconductor device manufacture; soldering; PWB material; aluminum alloy electrodes; electroless nickel-immersion gold process; electrolytic solder plating; electronic devices; electronic equipment; high mounting density; metal bumps; metal flame; mount semiconductor devices; packaging techniques; photo image process; plastic tape; semiconductor device; semiconductor devices; semiconductor manufacturing process; solder bump; vacuum process; Adhesives; Aluminum alloys; Corrosion; Electrodes; Nickel; Surface treatment; Zinc;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT), 2011 6th International
  • Conference_Location
    Taipei
  • ISSN
    2150-5934
  • Print_ISBN
    978-1-4577-1387-3
  • Electronic_ISBN
    2150-5934
  • Type

    conf

  • DOI
    10.1109/IMPACT.2011.6117175
  • Filename
    6117175