DocumentCode :
2842782
Title :
Estimation for equivalent thermal conductivity of silicon-through vias TSVs used for 3D IC integration
Author :
Chien, Heng-Chieh ; Lau, John H. ; Chao, Yu-Lin ; Tain, Ra-Min ; Dai, Ming-Ji ; Lo, Wei-Chung ; Kao, Ming-Jer
Author_Institution :
Electron. & Optoelectron. Res. Labs., Ind. Technol. Res. Inst. (ITRI), Hsinchu, Taiwan
fYear :
2011
fDate :
19-21 Oct. 2011
Firstpage :
153
Lastpage :
156
Abstract :
In this study, thermal performance of 3D IC integration is investigated. Emphasis is placed on the determination of a set of equivalent thermal conductivity equations for Cu-filled TSVs with various TSV diameters, TSV pitches, TSV thicknesses, passivation thicknesses, and microbump pads. Also, a slice model to imitate a 3D memory stacked chip is adopted to verify the accuracy of the equivalent equations. Finally, the feasibility of these equivalent equations is demonstrated through a simple 3D IC integration structure.
Keywords :
passivation; thermal conductivity measurement; three-dimensional integrated circuits; 3D IC integration; TSV diameter; TSV pitch; TSV thickness; equivalent thermal conductivity; microbump pads; passivation thickness; silicon-through vias; Electronic packaging thermal management; Equations; Heating; Mathematical model; Three dimensional displays; Through-silicon vias;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT), 2011 6th International
Conference_Location :
Taipei
ISSN :
2150-5934
Print_ISBN :
978-1-4577-1387-3
Electronic_ISBN :
2150-5934
Type :
conf
DOI :
10.1109/IMPACT.2011.6117240
Filename :
6117240
Link To Document :
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