Title :
Application of SiGe heterojunction transistors in silicon based monolithic millimeter-wave integrated circuits
Author :
Rong, Liu ; Wensheng, Qian ; Tongli, Wet
Author_Institution :
Microelectron. Center, Southeast Univ., Nanjing, China
Abstract :
Silicon-based millimeter-wave integrated circuits are playing more and more important roles in high frequency microwave electronics. Recent progress in SiGe device technology has improved cutoff frequencies of these devices to beyond 110 GHz. Such high speed transistors, compatible with standard, industrial Si production lines, allow low cost, high level integration and make the fabrication of silicon-based monolithic millimeter-wave integrated circuits (MIMICs) a genuine possibility. This paper presents a one dimensional calculation of the transistor performance and the trade-offs available to operate this device at millimeter-waves frequencies. The device structure of a SiGe heterojunction bipolar transistor and the Si-SiGe MIMIC technology are discussed
Keywords :
Ge-Si alloys; bipolar MIMIC; heterojunction bipolar transistors; millimetre wave bipolar transistors; semiconductor materials; 110 GHz; EHF; Si based monolithic MM-wave ICs; Si production line compatibility; Si-SiGe; Si-SiGe MIMIC technology; SiGe heterojunction transistors; cutoff frequencies; fabrication; heterojunction bipolar transistor; high speed transistors; millimeter-wave integrated circuits; transistor performance calculation; Cutoff frequency; Germanium silicon alloys; Heterojunctions; Integrated circuit technology; MIMICs; Microwave devices; Microwave transistors; Millimeter wave integrated circuits; Silicon germanium; Textile industry;
Conference_Titel :
Microwave and Millimeter Wave Technology Proceedings, 1998. ICMMT '98. 1998 International Conference on
Conference_Location :
Beijing
Print_ISBN :
0-7803-4308-5
DOI :
10.1109/ICMMT.1998.768262