DocumentCode
2843278
Title
Micromachined silicon antennas
Author
Chen, Q. ; Fusco, V.F. ; Zheng, M. ; Hall, P.S.
Author_Institution
Dept. of Electr. & Electron. Eng., Queen´´s Univ., Belfast, UK
fYear
1998
fDate
1998
Firstpage
289
Lastpage
292
Abstract
The effects of a new processing procedure for creating cantilevered conductors at edges of silicon trenches at radiating edges of a silicon microstrip patch antenna and slot loop antenna are examined in this paper. It has been found that trenches with cantilevered conductors generated from the back side of a wafer can effectively reduce the effective dielectric constant of the substrate, improve radiation patterns and enhance radiation
Keywords
antenna radiation patterns; elemental semiconductors; micromachining; microstrip antennas; millimetre wave antennas; permittivity; silicon; slot antennas; Si; Si trenches; cantilevered conductors; effective dielectric constant; micromachined Si antennas; microstrip patch antenna; processing procedure; radiation enhancement; radiation patterns; slot loop antenna; substrate permittivity reduction; Conductors; Dielectric constant; Dielectric materials; Dielectric substrates; Etching; Frequency; Microstrip antennas; Silicon; Slot antennas; Slotline;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave and Millimeter Wave Technology Proceedings, 1998. ICMMT '98. 1998 International Conference on
Conference_Location
Beijing
Print_ISBN
0-7803-4308-5
Type
conf
DOI
10.1109/ICMMT.1998.768282
Filename
768282
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