Title :
Decomposition of fluorocarbon gaseous contaminants by surface discharge induced plasma chemical processing
Author :
Oda, Tetsuji ; Takahashi, Tadashi ; Nakano, Hiroshi ; Masuda, Senichi
Author_Institution :
Fac. of Eng., Tokyo Univ., Japan
fDate :
Sept. 28 1991-Oct. 4 1991
Abstract :
Surface discharge induced plasma chemical processing (SPCP) using a high-grade alumina-based cylindrical reactor with an embedded ground electrode and stripe-shaped surface metal electrodes was applied to decompose chlorofluorocarbon contaminants in air, nitrogen, and oxygen. A very high decomposition rate, more than 99%, was observed for 100 or 1000 p.p.m. CFC-113. Greater electric power is found to be necessary to decompose the chemically stable fluorocarbon, but a substantial further improvement of efficiency will be possible in the near future. The authors feel that this system will be effective to decompose dilute fluorocarbon in large quantities.<>
Keywords :
air pollution detection and control; electric breakdown of gases; electrodes; electrostatic devices; electrostatics; surface discharges; Al/sub 2/O/sub 3/; CFC-113; cylindrical reactor; decomposition; efficiency; electrostatic devices; embedded ground electrode; fluorocarbon gaseous contaminants; pollution control; surface discharge induced plasma chemical processing; Ceramics; Chemical processes; Chemical technology; Inductors; Nitrogen; Plasma chemistry; Plasma materials processing; Surface contamination; Surface discharges; Testing;
Conference_Titel :
Industry Applications Society Annual Meeting, 1991., Conference Record of the 1991 IEEE
Conference_Location :
Dearborn, MI, USA
Print_ISBN :
0-7803-0453-5
DOI :
10.1109/IAS.1991.178320
