• DocumentCode
    2847122
  • Title

    Automated wafer analysis using wafer map autocorrelation

  • Author

    Hopcraft, G.

  • Author_Institution
    Hewlett-Packard, USA
  • fYear
    1998
  • fDate
    3-4 Dec. 1998
  • Firstpage
    82
  • Lastpage
    87
  • Abstract
    A complete wafer map contains information sufficient to discriminate certain prober errors, parametric errors, and point defect errors even without the full measured data set. Autocorrelation of the wafer map allows a simple automated analysis system to provide immediate feedback to the operator of known errors, allowing immediate retest in case of wafer probing errors and providing information to process engineers about possible manufacturing errors. The author provides a description of an algorithm which has proven useful in increasing measured yield and differentiating point defect errors from more traditional process errors.
  • Keywords
    correlation methods; failure analysis; inspection; integrated circuit yield; algorithm; automated autocorrelation analysis; parametric error; point defect error; prober error; process error; wafer failure map; yield; Autocorrelation; Detectors; Feedback; Information analysis; Manufacturing automation; Manufacturing processes; Pattern recognition; Scattering; Testing; White noise;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    ARFTG Conference Digest, 1998. Computer-Aided Design and Test for High-Speed Electronics. 52nd
  • Conference_Location
    Rohnert Park, CA, USA
  • Print_ISBN
    0-7803-5686-1
  • Type

    conf

  • DOI
    10.1109/ARFTG.1998.768628
  • Filename
    768628