Title :
Current crowding on metal contacts to planer devices
Author :
Murrmann, H. ; Widmann, Daniel
Author_Institution :
Siemans AG, Munich, Germany
Abstract :
The results of a theoretical and experimental investigation of contact resistance and current distribution in metal-to-silicon contacts of planar devices will be presented. Typical experimental values of the transition resistance between metal and diffusion layers will be offered.
Keywords :
Conductivity; Contact resistance; Current distribution; Electric resistance; Geometry; Impurities; Metalworking machines; Proximity effect; Surface resistance; Transmission lines;
Conference_Titel :
Solid-State Circuits Conference. Digest of Technical Papers. 1969 IEEE Internationa
Conference_Location :
Philadelphia, PA, USA
DOI :
10.1109/ISSCC.1969.1154703
