Title :
25 nm-wide silicon wire fabrication with i-line photolithography for efficient spot size converters
Author :
Sakakibara, Y. ; Ichimura, N. ; Kamei, T. ; Itoga, E. ; Masakage, T. ; Nakanishi, K. ; Shoji, Y. ; Okano, M. ; Kintaka, K. ; Kawashima, H. ; Mori, M.
Abstract :
Free from the resolution limit, very narrow inverse taper structure of silicon wire could be fabricated with i-line photolithography. By covering the taper with a polyimide waveguide core, efficient coupling from optical fiber to silicon wire waveguide was possible.
Keywords :
integrated optics; optical fabrication; optical fibre couplers; optical polymers; optical waveguides; photolithography; silicon; Si; i-line photolithography; optical fiber coupling; polyimide waveguide core; silicon wire fabrication; silicon wire waveguide; size 25 nm; spot size converters; very narrow inverse taper structure; Couplings; Fabrication; Lithography; Optical waveguides; Resists; Silicon; Wire;
Conference_Titel :
Optical Communication (ECOC), 2010 36th European Conference and Exhibition on
Conference_Location :
Torino
Print_ISBN :
978-1-4244-8536-9
Electronic_ISBN :
978-1-4244-8534-5
DOI :
10.1109/ECOC.2010.5621412
