DocumentCode :
2849131
Title :
Dynamic control of high-current ion-electron sources with micro-second length
Author :
Orlikov, L.N.
Author_Institution :
Tomsk Univ. of Control Syst. & Radioelectron., Russia
fYear :
1998
fDate :
1998
Firstpage :
79
Lastpage :
80
Abstract :
In ion-electron sources, based on vacuum-arc generators, electrical parameters of plasma generators are related to the shape of the plasma flow and the current density distribution at the target. Plasma-gas dynamic control is performed through formation of the plasma front local parameters. The device efficiency is raised without affecting the electrical parameters
Keywords :
current density; current distribution; plasma flow; plasma production; plasma transport processes; process control; vacuum arcs; dynamic control; electrical parameters; high-current ion-electron sources; microsecond length; plasma flow shape; plasma front local parameters; plasma generators; plasma-gas dynamic control; target current density distribution; vacuum-arc generators; Acceleration; Plasma accelerators; Plasma applications; Plasma density; Plasma devices; Plasma materials processing; Plasma sources; Plasma temperature; Plasma waves; Reproducibility of results;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Instrument Engineering Proceedings, 1998. APEIE-98. Volume 1. 4th International Conference on Actual Problems of
Conference_Location :
Novosibirsk
Print_ISBN :
0-7803-4938-5
Type :
conf
DOI :
10.1109/APEIE.1998.768914
Filename :
768914
Link To Document :
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