DocumentCode
2849956
Title
Design and performance of the GaAs FET
Author
Bechtel, N. ; Hooper, W. ; Hower, P.
Author_Institution
Fairchild Semiconductor, Palo Alto, CA, USA
Volume
XIII
fYear
1970
fDate
18-20 Feb. 1970
Firstpage
50
Lastpage
51
Abstract
A GaAs field-effect transistor that exhibits a unilateral gain of 17 dB at 2 GHz and an
of greater than 12 GHz has been developed. Device employs an epitaxial N-type channel deposited on a semi-insulating GaAs substrate with a Schottky barrier gate.
of greater than 12 GHz has been developed. Device employs an epitaxial N-type channel deposited on a semi-insulating GaAs substrate with a Schottky barrier gate.Keywords
Circuits; Doping; Electron mobility; FETs; Frequency; Gallium arsenide; Geometry; Schottky barriers; Substrates; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Circuits Conference. Digest of Technical Papers. 1970 IEEE International
Conference_Location
Philadelphia, PA, USA
Type
conf
DOI
10.1109/ISSCC.1970.1154856
Filename
1154856
Link To Document