Lag free transfer transistor in CMOS image sensor pixel with a non-uniform doped gate

A transfer transistor structure achieving complete charge transfer in a CMOS image sensor pixel is proposed to eliminate image lag. This structure adopted double N implants for photodiode to ensure a wide channel of charge transfer, a surface P type preventing from dark current and especially a non-uniform doped poly-silicon gate to adjust the potential profile in channel. The simulation results show that if a light pulse of 10000lux illuminates for one integration cycle, the signal voltage of the following frame drops to 1/50000 of the first one. The electron density in N buried layer after charge transfer is around 10⁸/cm³, far below the intrinsic value.