DocumentCode :
2852344
Title :
Gm enhancement for bulk-driven sub-threshold differential pair in nanometer CMOS process
Author :
Ferreira, Luis H. C. ; Sonkusale, Sameer R.
Author_Institution :
Syst. Eng. & Inf. Technol. Inst., Fed. Univ. of Itajuba, Itajuba, Brazil
fYear :
2012
fDate :
9-10 Oct. 2012
Firstpage :
1
Lastpage :
3
Abstract :
In this paper a simple and efficient way to enhance the transconductance Gm for bulk-driven sub-threshold differential pair in nanometer CMOS process is presented. This approach is based on a type of positive feedback source degeneration, which does not depend on geometry parameters or biasing voltages, and leads to improved values for the DC gain and the unity gain frequency, without increasing power consumption or changing other features. Despite of possible differential pair output resistance variation, the DC gain and the unity gain frequency of weak inversion differential pair can be increased by (n + 1)/(n - 1) times (e.g., 13.72 times in an 130-nm IBM CMOS process), a factor that improves with scaling while many other device characteristics degrade.
Keywords :
CMOS integrated circuits; circuit feedback; differential amplifiers; nanoelectronics; DC gain; Gm enhancement; biasing voltages; bulk-driven differential pair; geometry parameters; nanometer CMOS process; positive feedback source degeneration; size 130 nm; unity gain frequency; weak inversion differential pair; CMOS process; Gain; Power demand; Threshold voltage; Transconductance; Transistors; Gm enhancement; bulk-driven differential pair; low-power applications; low-voltage; nanometer CMOS process;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Subthreshold Microelectronics Conference (SubVT), 2012 IEEE
Conference_Location :
Waltham, MA
Print_ISBN :
978-1-4673-1586-9
Type :
conf
DOI :
10.1109/SubVT.2012.6404320
Filename :
6404320
Link To Document :
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