DocumentCode
2852440
Title
A new type of gallium arsenide field-effect phototransistor
Author
Swartz, G. ; Gonzalez, Adriana ; Dreeben, A.
Author_Institution
RCA Labs., Princeton, NJ, USA
Volume
XIV
fYear
1971
fDate
17-19 Feb. 1971
Firstpage
134
Lastpage
135
Abstract
A gallium-arsenide field-effect phototransistor, which responds to infrared radiation at a wavelength of 1.5 μ will be covered. The device is fabricated from chromium-doped semi-insulating GaAs with a thin epitaxial N-type surface layer.
Keywords
Chromium; Cutoff frequency; Electrons; Gallium arsenide; Immune system; Impurities; Insulation; Phototransistors; Substrates; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Circuits Conference. Digest of Technical Papers. 1971 IEEE International
Conference_Location
Philadelphia, PA, USA
Type
conf
DOI
10.1109/ISSCC.1971.1154998
Filename
1154998
Link To Document