DocumentCode :
2852440
Title :
A new type of gallium arsenide field-effect phototransistor
Author :
Swartz, G. ; Gonzalez, Adriana ; Dreeben, A.
Author_Institution :
RCA Labs., Princeton, NJ, USA
Volume :
XIV
fYear :
1971
fDate :
17-19 Feb. 1971
Firstpage :
134
Lastpage :
135
Abstract :
A gallium-arsenide field-effect phototransistor, which responds to infrared radiation at a wavelength of 1.5 μ will be covered. The device is fabricated from chromium-doped semi-insulating GaAs with a thin epitaxial N-type surface layer.
Keywords :
Chromium; Cutoff frequency; Electrons; Gallium arsenide; Immune system; Impurities; Insulation; Phototransistors; Substrates; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Circuits Conference. Digest of Technical Papers. 1971 IEEE International
Conference_Location :
Philadelphia, PA, USA
Type :
conf
DOI :
10.1109/ISSCC.1971.1154998
Filename :
1154998
Link To Document :
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