Title :
Improvement of high-frequency FinFET performance by fin width engineering
Author :
Makovejev, S. ; Olsen, Svein Harald ; Arshad, M. K. Md ; Flandre, Denis ; Raskin, Jean-Pierre ; Kilchytska, V.
Author_Institution :
Sch. of Electr. & Electron. Eng., Newcastle Univ., Newcastle upon Tyne, UK
Abstract :
Frequency dependent behaviour of MOSFETs arises from self-heating and source-to-drain coupling through the substrate. In this work the output conductance variation with frequency is experimentally investigated in FinFETs with various fin widths. We demonstrate that fin narrowing suppresses the output conductance degradation due to the substrate effect in the high-frequency range such that self-heating dominates the output conductance variation. The work thus emphasizes the importance of thermal management and device design in FinFETs.
Keywords :
MOSFET; FinFET device design; MOSFET; fin width engineering; frequency dependent behaviour; high-frequency FinFET performance; output conductance degradation suppression; output conductance variation; self-heating coupling; source-to-drain coupling; substrate effect; thermal management; Couplings; Educational institutions; FinFETs; Frequency response; Logic gates; Substrates;
Conference_Titel :
SOI Conference (SOI), 2012 IEEE International
Conference_Location :
NAPA, CA
Print_ISBN :
978-1-4673-2690-2
Electronic_ISBN :
1078-621X
DOI :
10.1109/SOI.2012.6404381