DocumentCode
2852996
Title
Improvement of high-frequency FinFET performance by fin width engineering
Author
Makovejev, S. ; Olsen, Svein Harald ; Arshad, M. K. Md ; Flandre, Denis ; Raskin, Jean-Pierre ; Kilchytska, V.
Author_Institution
Sch. of Electr. & Electron. Eng., Newcastle Univ., Newcastle upon Tyne, UK
fYear
2012
fDate
1-4 Oct. 2012
Firstpage
1
Lastpage
2
Abstract
Frequency dependent behaviour of MOSFETs arises from self-heating and source-to-drain coupling through the substrate. In this work the output conductance variation with frequency is experimentally investigated in FinFETs with various fin widths. We demonstrate that fin narrowing suppresses the output conductance degradation due to the substrate effect in the high-frequency range such that self-heating dominates the output conductance variation. The work thus emphasizes the importance of thermal management and device design in FinFETs.
Keywords
MOSFET; FinFET device design; MOSFET; fin width engineering; frequency dependent behaviour; high-frequency FinFET performance; output conductance degradation suppression; output conductance variation; self-heating coupling; source-to-drain coupling; substrate effect; thermal management; Couplings; Educational institutions; FinFETs; Frequency response; Logic gates; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference (SOI), 2012 IEEE International
Conference_Location
NAPA, CA
ISSN
1078-621X
Print_ISBN
978-1-4673-2690-2
Electronic_ISBN
1078-621X
Type
conf
DOI
10.1109/SOI.2012.6404381
Filename
6404381
Link To Document