• DocumentCode
    2852996
  • Title

    Improvement of high-frequency FinFET performance by fin width engineering

  • Author

    Makovejev, S. ; Olsen, Svein Harald ; Arshad, M. K. Md ; Flandre, Denis ; Raskin, Jean-Pierre ; Kilchytska, V.

  • Author_Institution
    Sch. of Electr. & Electron. Eng., Newcastle Univ., Newcastle upon Tyne, UK
  • fYear
    2012
  • fDate
    1-4 Oct. 2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Frequency dependent behaviour of MOSFETs arises from self-heating and source-to-drain coupling through the substrate. In this work the output conductance variation with frequency is experimentally investigated in FinFETs with various fin widths. We demonstrate that fin narrowing suppresses the output conductance degradation due to the substrate effect in the high-frequency range such that self-heating dominates the output conductance variation. The work thus emphasizes the importance of thermal management and device design in FinFETs.
  • Keywords
    MOSFET; FinFET device design; MOSFET; fin width engineering; frequency dependent behaviour; high-frequency FinFET performance; output conductance degradation suppression; output conductance variation; self-heating coupling; source-to-drain coupling; substrate effect; thermal management; Couplings; Educational institutions; FinFETs; Frequency response; Logic gates; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference (SOI), 2012 IEEE International
  • Conference_Location
    NAPA, CA
  • ISSN
    1078-621X
  • Print_ISBN
    978-1-4673-2690-2
  • Electronic_ISBN
    1078-621X
  • Type

    conf

  • DOI
    10.1109/SOI.2012.6404381
  • Filename
    6404381