Title : 
The measurement of three dimensional dose distribution of a ruthenium-106 ophthalmological applicator using magnetic resonance imaging of BANG polymer gels
         
        
            Author : 
Chan, Maria F. ; Fung, Albert YC ; Hu, Yu Chi ; Amols, Howard ; Zaider, Marco ; Abramson, David
         
        
            Author_Institution : 
Dept. of Med. Phys., Memorial Sloan-Kettering Cancer Center, New York, NY, USA
         
        
        
        
        
        
            Abstract : 
The BANG (RIGS Research Inc., Guilford, CT) polymer gel has been used as a dosimeter to determine three-dimensional (3D) dose distribution of a Ruthenium-106 ophthalmological applicator. An eye phantom made of the BANG gel was irradiated by the Ru-106 source and was MR scanned after two weeks. The MR images were then converted to dose mapping through customized software. The results were comparable with those measured with radiographic films and diodes. It is concluded that the BANG gel dosimetry offers the potential for measuring the dose distribution of an ophthalmologic applicator, in three dimensions, with high spatial resolution and relatively good accuracy
         
        
            Keywords : 
biomedical MRI; dosimetry; eye; gels; radiation therapy; radioactive sources; ruthenium; 2 w; 106Ru ophthalmological applicator; BANG gel dosimetry; BANG polymer gels; Ru; diodes; dose distribution measurement; dose mapping; eye phantom; high spatial resolution; magnetic resonance imaging; radiographic films; relatively good accuracy; ruthenium-106 ophthalmological applicator; therapeutic nuclear medicine; Applicators; Calibration; Computed tomography; Dosimetry; Imaging phantoms; Magnetic resonance imaging; Malignant tumors; Manufacturing; Optical scattering; Polymer gels;
         
        
        
        
            Conference_Titel : 
Engineering in Medicine and Biology Society, 2000. Proceedings of the 22nd Annual International Conference of the IEEE
         
        
            Conference_Location : 
Chicago, IL
         
        
        
            Print_ISBN : 
0-7803-6465-1
         
        
        
            DOI : 
10.1109/IEMBS.2000.901291