Title :
Monolithic millimeter-wave corner-reflector antennas
Author :
Gearhart, S.S. ; Ling, C.C. ; Rebeiz, G.M.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
Abstract :
A high-gain monolithic millimeter-wave antenna has been designed for 240 GHz. The structure consists of a long-wire antenna suspended in a longitudinal pyramidal cavity etched in a silicon wafer. This results in a planar traveling-wave antenna backed by a corner reflector. The array pattern is calculated by the method of images, and the element pattern is calculated for an isolated traveling-wave antenna. A microwave scale model was constructed for 3.4 GHz. The input impedance is broadband, with a radiation resistance centered at 160 Omega and a reactance lower than 60 Omega . The measured 10 dB beamwidths for the E and quasi-H plane patterns are 35 degrees and 41 degrees , respectively. The measured gain is 19.3+or-0.2 dB. The antenna is well-suited for millimeter and submillimeter-wave imaging applications in large f-number systems. Typical application areas are radio astronomy, plasma diagnostics, and remote sensing.<>
Keywords :
antenna radiation patterns; antenna travelling wave arrays; electric impedance; microwave antenna arrays; reflector antennas; 19.3 dB; 240 GHz; 3.4 GHz; E-plane patterns; EHF; SHF; array pattern; beamwidths; corner-reflector antennas; element pattern; high-gain monolithic millimeter-wave antenna; input impedance; long-wire antenna; longitudinal pyramidal cavity; method of images; microwave antenna array; microwave scale model; planar traveling-wave antenna; quasi-H plane patterns; radiation resistance; reactance; Antenna arrays; Antenna measurements; Electrical resistance measurement; Etching; Extraterrestrial measurements; Millimeter wave technology; Plasma measurements; Reflector antennas; Semiconductor device modeling; Silicon;
Conference_Titel :
Antennas and Propagation Society International Symposium, 1990. AP-S. Merging Technologies for the 90's. Digest.
Conference_Location :
Dallas, TX, USA
DOI :
10.1109/APS.1990.115509