Title :
Design of high-frequency SAW filters
Author :
Shermagina, Ye.Yu. ; Mashinin, O.V. ; Sinitsyna, T.V.
Author_Institution :
BUTIS-M Ltd., Moscow
Abstract :
Standard contact photolithography are used for IF filters, inorder to manufacture 25...400 MHz operating frequencies, which corresponds to the 1.1...15 mum dimensions of pin structures. Results are presented of investigating different designs of high-frequency SAW filters for applications in IF paths of communications systems
Keywords :
photolithography; surface acoustic wave filters; telecommunication; 1.1 to 15 micron; 25 to 400 MHz; IF filter; communications system; high-frequency SAW filter; photolithography; pin structure; surface acoustic wave; Displays; Electrodes; Frequency; Organizing; Passband; Power harmonic filters; SAW filters; Surface acoustic waves; Transducers; Transversal filters;
Conference_Titel :
Microwave & Telecommunication Technology, 2005 15th International Crimean Conference
Conference_Location :
Sevastopol, Crimea
Print_ISBN :
966-7968-80-4
DOI :
10.1109/CRMICO.2005.1565040
